Metal working – Method of mechanical manufacture – Fluid pattern dispersing device making – e.g. – ink jet
Reexamination Certificate
2005-11-22
2005-11-22
Tugbang, A. Dexter (Department: 3729)
Metal working
Method of mechanical manufacture
Fluid pattern dispersing device making, e.g., ink jet
C029S846000, C029S831000, C029SDIG037, C427S097100, C427S097300, C427S259000, C216S018000, C216S027000, C347S047000, C347S055000
Reexamination Certificate
active
06966110
ABSTRACT:
A method of fabricating a liquid emission device includes a chamber having a nozzle orifice. Separately addressable dual electrodes are positioned on opposite sides of a central electrode. The three electrodes are aligned with the nozzle orifice. A rigid electrically insulating coupler connects the two addressable electrodes. To eject a drop, an electrostatic charge is applied to the addressable electrode nearest to the nozzle orifice, which pulls that electrode away from the orifice, drawing liquid into the expanding chamber. The other addressable electrode moves in conjunction, storing potential energy in the system. Subsequently the addressable electrode nearest to the nozzle is de-energized and the other addressable electrode is energized, causing the other electrode to be pulled toward the central electrode in conjunction with the release of the stored elastic potential energy. This action pressurizes the liquid in the chamber behind the nozzle orifice, causing a drop to be ejected from the nozzle orifice.
REFERENCES:
patent: 5244537 (1993-09-01), Ohnstein
patent: 5644341 (1997-07-01), Fujii et al.
patent: 5668579 (1997-09-01), Fujii et al.
patent: 5739831 (1998-04-01), Nakamura et al.
patent: 6127198 (2000-10-01), Coleman et al.
patent: 6318841 (2001-11-01), Coleman et al.
patent: 6322201 (2001-11-01), Beatty et al.
patent: 6345884 (2002-02-01), Yoon et al.
patent: 6357865 (2002-03-01), Kubby et al.
patent: 6662448 (2003-12-01), Kubby et al.
patent: 2001/0023523 (2001-09-01), Kubby et al.
patent: 4-344253 (1992-11-01), None
Yazdi et al., “An All-Silicon Single-Wafer Micro-g Accelerometer with a Combined Surface and Bulk Micromachining Process”, Journel of Microelectromechanical Systems, vol. 9, No. 4, Dec. 2000.
Patent Abstracts of Japan, Publication No. 10000770, Publication date Jun. 1, 1998, application date: Jun. 17, 1006, application number 08155125, Applicant: Fuji Xerox Co., Ltd, Title: Inkjet Recording Apparatus.
Patent Abstract of Japan, Publication No. 11309850, Publication date: Nov. 9, 1999, Application date: April 28, 1998, Application number 10119436, Applicant: Minolta Co., Ltd., Title: Ink Jet Head Driver Therefor and Ink Jet Recorder.
Chwalek James M.
DeBar Michael J.
Hawkins Gilbert A.
Eastman Kodak Company
Sales Milton S.
Tugbang A. Dexter
LandOfFree
Fabrication of liquid emission device with symmetrical... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fabrication of liquid emission device with symmetrical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication of liquid emission device with symmetrical... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3496945