Fabrication of high resolution aluminum ablation masks

Details Fabrication of high resolution aluminum ablation masks Fabrication of high resolution aluminum ablation masks

1997-01-29

1998-05-26

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

21912171, G03F 900

Patent

active

057562369

ABSTRACT:
A method of fabricating a high resolution ablation mask for use at laser fluences of greater than 200 mJ/cm.sup.2 is disclosed. The method comprises combining dry etching and chemical etching of an unetched ablation mask which comprises a transparent substrate, a layer of high UV light refractivity material, e.g. aluminum, deposited on said substrate, and a photoresist layer positioned on a predetermined area of said high UV light refractivity material layer leaving other areas of said high UV light refractivity material layer exposed.

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