Fabrication of high aspect ratio spacers for field emission disp

Details Fabrication of high aspect ratio spacers for field emission disp Fabrication of high aspect ratio spacers for field emission disp

1994-11-28

1996-04-23

Bradley, P. Austin

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

216 39, 216 40, H01J 924

Patent

active

055098401

ABSTRACT:
A method for fabricating high aspect ratio spacers for a field emission display is described. An array of field emission microtips is formed over a substrate. A layer of lithographic material is formed over the array of field emission microtips. Openings are formed in the layer of lithographic material. The openings may be formed by a plasma etch with oxygen, or by x-ray lithography. A non-outgassing material is formed over the surface of the layer of lithographic material, including in the openings. The openings are filled with a spacer material, the spacer material being a conductive material, an insulator, or, preferably, a combination thereof. Lastly, the layer of lithographic material and the non-outgassing material are removed.

REFERENCES:
patent: 4923421 (1990-05-01), Brodie et al.
patent: 5063327 (1991-11-01), Brodie et al.
patent: 5151061 (1992-09-01), Sandhu
patent: 5205770 (1993-04-01), Lowrey et al.
patent: 5232549 (1993-08-01), Cathey et al.

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