Fabrication of high aspect ratio masks

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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Details

96 351, 96 362, 250492R, 427272, 427273, B05D 306

Patent

active

040189384

ABSTRACT:
A method of constructing masks characterized by a high aspect ratio. The method includes at least a single exposure of a mask by radiation which is transmitted by the substrate before impinging on the resist. In a specific embodiment the mask is partially completed and the already deposited mask modulates the radiation transmitted by the substrate before it exposes the resist.

REFERENCES:
patent: 3740280 (1973-06-01), Ronen
patent: 3743842 (1973-07-01), Smith et al.
patent: 3767398 (1973-10-01), Morgan

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