Fabrication of group III-nitride photocathode having Cs...

Details Fabrication of group III-nitride photocathode having Cs... Fabrication of group III-nitride photocathode having Cs...

2006-03-16

2008-11-25

Williams, Joseph L. (Department: 2889)

Electric lamp or space discharge component or device manufacturi

Process

Electrode making

C445S035000, C134S019000

Reexamination Certificate

active

07455565

ABSTRACT:
Improved photocathodes are provided by a fabrication method including steps of wet chemically cleaning the photocathode emission surface (to reduce the level of cleaning-induced surface damage), two stage heat treatment (to complete the cleaning without desorbing nitrogen from the emission surface), followed by activation with Cs only, as opposed to Cs—O. The resulting photocathodes have improved performance (lifetime, brightness, efficiency) compared to conventional photocathodes, and are thus attractive candidates for demanding photocathode applications.

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Machuca, Francisco et al., “Simple Method for Cleaning Gallium Nitride (0001),” J. Vac. Sci. Technol. A 20(5), Sep./Oct. 2002, pp. 1784-1786.

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