Fabrication of gallium arsenide MOS devices

Metal working – Method of mechanical manufacture – Assembling or joining

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29584, 204164, 204192C, B01J 1700

Patent

active

041446348

ABSTRACT:
A method of fabricating gallium arsenide MOS devices with improved stoichiometric and electrical properties is disclosed. The device includes a gallium arsenide substrate overlaid with a native oxide and an aluminum oxide layer. The device is fabricated using a plasma oxidizing process.

REFERENCES:
patent: 4062747 (1977-12-01), Chang
Electronics Letters, vol. 13, No. 2, Jan. 20, 1977, "Stable Charge Storage of M.A.O.S. etc.," by Bayraktaroglu et al., pp. 45 & 46.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fabrication of gallium arsenide MOS devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fabrication of gallium arsenide MOS devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication of gallium arsenide MOS devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-213841

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.