Fabrication of field emitting tips

Details Fabrication of field emitting tips Fabrication of field emitting tips

1999-06-04

2000-05-16

Ramsey, Kenneth J.

Electric lamp and discharge devices

Discharge devices having a multipointed or serrated edge...

445 24, 445 50, H01J 902

Patent

active

060641452

ABSTRACT:
A method of forming a field emission device for a flat panel display includes providing a conductive silicon substrate, forming a hole on the upper surface of the substrate, covering the hole with a conductive layer of silicon to form a valley in portions of the layer of silicon above the hole, covering the silicon layer with a first oxide layer, planarizing the first oxide layer to leave oxide mainly in the valley, etching the oxide left in the valley and the layer of silicon to form a portion of the layer of silicon into a structure having a peak above the hole, forming a second oxide layer to cover the peak, planarizing the second oxide layer to leave a small amount of oxide above the peak, selectively etching the second oxide layer to form a step around the peak, forming a metal layer on portions on the second oxide layer, etching the metal layer to remove metal from above the step, forming a first silicon nitride layer on the step and remaining portions of the metal layer, selectively etching a portion of the first silicon nitride layer above the step, forming a second silicon nitride layer on the device, non-selectively etching the second silicon nitride layer, etching the step to expose the peak, and removing the second silicon nitride layer.

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