Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1986-05-28
1987-08-25
Valentine, Donald R.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
20412955, 20412975, C25F 312
Patent
active
046891250
ABSTRACT:
A process is described for making semiconductor lasers with cleaved facets for end mirrors. The process involves electrochemically photoetching slots with deep, narrow cross-sections in a wafer and applying stress to cleave the wafer in the desired place. Extremely short and reproducible semiconductor lasers can be made by this procedure (less than 50 or even 25 .mu.m) which yields extremely useful semiconductor lasers particularly for communication applications. Also, the procedure requires a minimum of skill to produce excellent quality cleaved semiconductor lasers (including short-length lasers) with high yields.
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Burrus, Jr. Charles A.
Kohl Paul A.
Lee Tien P.
Ostermayer, Jr. Frederick W.
American Telephone & Telegraph Co., AT&T Bell Labs
Nilsen Walter G.
Valentine Donald R.
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