Fabrication of bi-level circuits

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427123, 427125, 427282, 427376B, 427377, 427380, 29625, 174685, H05K 104, H05K 108

Patent

active

041917898

ABSTRACT:
Disclosed is a method of fabricating bi-level circuits which include metallization of via holes (14 and 15) in insulating subustrates (10). A thick film metal paste (13) is prepared which according to one embodiment comprises copper, glass frit and an organic vehicle including a low molecular weight ethyl cellulose binder and solvents of butyl carbitol acetate and alpha terpineol. The paste is deposited onto the substrate and through the holes. The structure is baked with the printed surface (12) down in order to establish a solvent concentration gradient in the paste which results in solid material accumulating away from the printed surface to form the contact pad (16). The material is then fired to establish the desired conductivity.

REFERENCES:
patent: 3269861 (1966-08-01), Schneble
patent: 3357856 (1967-12-01), Ragan
patent: 3647532 (1972-03-01), Friedman
patent: 4020206 (1977-04-01), Beil
patent: 4024629 (1977-05-01), Lemoine
patent: 4064290 (1977-12-01), Ebel
Kline et al., "Thick Film . . . Through Holes", 1973 Internation. Microelectronics Symposium, pp. 3A-2-1 to 3A-2-6.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fabrication of bi-level circuits does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fabrication of bi-level circuits, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication of bi-level circuits will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2040235

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.