Fabrication of atomic step-free surfaces

Details Fabrication of atomic step-free surfaces Fabrication of atomic step-free surfaces

1996-08-22

1999-06-08

Codd, Bernard

Coating processes

With post-treatment of coating or coating material

Heating or drying

4273722, 4273977, 427551, 427596, 216 79, 438402, 438412, 438471, 438697, 438698, 438719, 438759, 438760, 438795, B05D 302

Patent

active

059103396

ABSTRACT:
Fabrication of atomic step-free regions on a substrate surface is achieved by first forming a two-dimensional pattern on the substrate. The pattern is preferably a grating comprising an array of troughs or mesas which are separated from one another by a plurality of ridges or trenches. Any atomic steps on the flat top surfaces of the troughs or mesas are moved into barrier regions formed by the ridge or trench sidewalls during a high temperature annealing or deposition step, thereby leaving the flat surfaces of the troughs and mesas free of atomic steps. Structures having step-free regions large enough to accommodate micron sized devices having nanometer sized features are thereby formed.

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