Fabrication method of superconducting quantum interference devic

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Tunneling through region of reduced conductivity

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257 34, 257 33, 505190, 505191, H01L 2906

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056659806

ABSTRACT:
A method of fabricating a superconducting quantum interference device (DC-SQUID) constructed from short weak links with untrafine wires. The method comprises the following steps: successive forming a niobium nitride film and a silicon nitride film on a substrate; oblique etching of the niobium nitride film and said silicon nitride film with respect to the substrate by a reactive ion etching process using a mixture of oxygen and CF.sub.4 gases to form an olique edge; and successive forming a barrier thin film and a counterelectrode of niobium on the said edge. The short weak links wire fabricated by field evaporation technique. The counterelectrode material were field-evaporated and formed the conductive paths in the pinholes in the insulating thin film.

REFERENCES:
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D. Pascal, "Simple Fabrication and Characterization of Thin-Film Niobium Squid's Working at 4.2 K," SQUID '80, .COPYRGT.1980 Walter de Gruyter & Co., Berlin .cndot. New York, pp. 417-422.
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