Wave transmission lines and networks – Coupling networks – Electromechanical filter
Reexamination Certificate
2006-08-22
2006-08-22
Summons, Barbara (Department: 2817)
Wave transmission lines and networks
Coupling networks
Electromechanical filter
C029S025350
Reexamination Certificate
active
07095299
ABSTRACT:
In a fabrication method of a SAW device, a first conductive layer, an etch-stop layer made of conductive material and a second conductive layer are formed one atop another in order on a piezoelectric ceramic substrate. A mask is provided on a first portion of the second conductive layer corresponding to a first SAW filter. A second portion of the second conductive layer corresponding to a second SAW filter is selectively removed using the mask. The mask is removed and a photoresist pattern used for forming electrodes of the SAW filters is provided on the first portion of the second conductive layer corresponding to the first SAW filter region and on a first portion of the etch-stop layer corresponding to the second SAW filter region. The first and second conductive layers and the etch-stop layer are selectively removed using the photoresist pattern, and the photoresist pattern is then removed.
REFERENCES:
patent: 5591480 (1997-01-01), Weisman et al.
patent: 6377138 (2002-04-01), Takagi et al.
patent: 10-93369 (1998-04-01), None
patent: 10-190390 (1998-07-01), None
patent: 2002-319834 (2002-10-01), None
Lee Jeong Yub
Park Jang Ho
Lowe Hauptman & Berner LLP
Samsung Electro-Mechanics Co. Ltd.
Summons Barbara
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