Fabrication method for photomask, fabrication method for...

Details Fabrication method for photomask, fabrication method for... Fabrication method for photomask, fabrication method for...

2006-03-21

2010-02-23

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

07666553

ABSTRACT:
A fabrication method for a photomask is disclosed. Two or more metal containing layers are formed over a substrate, and a main pattern and a monitor pattern are formed over one or more of the two or more metal containing layers other than the lowermost metal containing layer. Then, the monitor pattern is measured, and the monitor pattern after being measured is removed. Then, the main pattern is formed over the lowermost metal containing layer to fabricate a photomask formed from the two or more metal containing layers.

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Korean Office Action dated Mar. 30, 2007, Application No. 10-2006-32779.
European Search Report dated Jun. 30, 2006 for Application No. 06005944.1-2222.

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