Fabrication and use of polished silicon micro-mirrors

Details Fabrication and use of polished silicon micro-mirrors Fabrication and use of polished silicon micro-mirrors

2005-06-17

2008-12-30

Tran, Binh X (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

C438S747000, C438S748000, C438S753000, C216S024000

Reexamination Certificate

active

07470622

ABSTRACT:
A method of fabricating silicon micro-mirrors includes etching from opposite sides of a silicon wafer with a polished surface on at least one of the opposite sides, to form silicon bars each having a parallelogram-shaped cross-section and including a portion of the polished surface. At least one of the silicon bars is mounted on a mounting surface. The polished surface of the silicon bar may be used to reflect optical signals.

REFERENCES:
patent: 6205274 (2001-03-01), Zhou
patent: 6900922 (2005-05-01), Aubuchon
patent: 2002/0094152 (2002-07-01), Feierabend et al.
patent: 2002/0181852 (2002-12-01), Husain et al.
patent: 2003/0054646 (2003-03-01), Yotsuya
patent: 2004/0008401 (2004-01-01), Szczepanek et al.
patent: 2004/0145822 (2004-07-01), Pan et al.

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