Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2011-06-28
2011-06-28
Luu, Chuong A. (Department: 2892)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S149000, C438S153000, C438S199000
Reexamination Certificate
active
07968367
ABSTRACT:
A fabricating method of a TFT array substrate includes following steps: providing a substrate having a pixel region and a bonding pad region surrounding the pixel region; forming a patterned polysilicon layer within the pixel region on the substrate; forming a first patterned insulating layer to cover the patterned polysilicon layer; forming a first patterned transparent conductive layer on the first patterned insulating layer; forming a first metal layer on the first patterned transparent conductive layer; forming a second patterned insulating layer to cover the first metal layer; forming a second patterned transparent conductive layer on the second patterned insulating layer; forming a second metal layer on the second patterned transparent conductive layer; forming a third patterned insulating layer to cover the second metal layer; and forming a third patterned transparent conductive layer on the third patterned insulating layer.
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patent: 2001/0019372 (2001-09-01), Ootsu et al.
Chen Li-Shan
Chien Yao-Hong
Liu Xuan-Yu
Wang Chih-chieh
Chunghwa Picture Tubes Ltd.
Jianq Chyun IP Office
Luu Chuong A.
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