Fabricating compound semiconductor by varying ratio of stagnant

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Compound semiconductor

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438796, 438 37, 438925, 438493, 438933, 438680, 438935, H01L 2100

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059372737

ABSTRACT:
A fabricating method of compound semiconductor device is proposed which has a step of varying selective growth ratio of crystal by changing either a mean free path of material gas in gas atmosphere for use in crystal growth or a thickness of a stagnant layer of the material gas, using selective growth mask having opening portion consisting of first region having a narrow width and second region having a wide width.

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