Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics
Reexamination Certificate
2008-12-22
2010-12-07
Ngo, Ngan (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Integrated circuit structure with electrically isolated...
Passive components in ics
C257S537000, C257S577000, C257SE27055, C257SE27076
Reexamination Certificate
active
07847373
ABSTRACT:
A bipolar junction transistor may act as a select device for a semiconductor memory. The bipolar junction transistor may be formed of a stack of base and collector layers. Sets of parallel trenches are formed in a first direction down to the base and in a second direction down to the collector. The trenches may be used to form local enhancement implants into the exposed portion of the base and collector in each trench. As a result of the local enhancement implants, in some embodiments, leakage current may be reduced, active current capability may be higher, gain may be higher, base resistance may be reduced, breakdown voltage may be increased, and parasitic effects with adjacent junctions may be reduced.
REFERENCES:
patent: 6989580 (2006-01-01), Pellizzer et al.
patent: 2004/0041236 (2004-03-01), Forbes
patent: 2004/0130000 (2004-07-01), Pellizzer et al.
patent: 2007/0273006 (2007-11-01), Beasom
Benvenuti Augusto
Pellizzer Fabio
Pirovano Agostino
Servalli Giorgio
Ngo Ngan
Trop Pruner & Hu P.C.
LandOfFree
Fabricating bipolar junction select transistors for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fabricating bipolar junction select transistors for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabricating bipolar junction select transistors for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4162770