Fabricating amorphous silicon solar cells by varying the tempera

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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136258, 357 2, 357 30, 427 74, 427 86, H01L 3118

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043394701

ABSTRACT:
An improved process for fabricating amorphous silicon solar cells in which the temperature of the substrate is varied during the deposition of the amorphous silicon layer is described. Solar cells manufactured in accordance with this process are shown to have increased efficiencies and fill factors when compared to solar cells manufactured with a constant substrate temperature during deposition of the amorphous silicon layer.

REFERENCES:
patent: 4226643 (1980-10-01), Carlson
patent: 4253882 (1981-03-01), Dalal
patent: 4297392 (1981-10-01), Higashi et al.
R. C. Chittick et al., "The Preparation & Properties of Amorphous Silicon", J. Electrochem. Soc., vol. 116, pp. 77-81 (1969).
P. J. Zanzucchi et al., "Optical & Photoconductive Properties of Discharge-Produced Amorphous Silicon", J. Appl. Phys., vol. 48, pp. 5227-5236 (1977).
D. E. Carlson et al., "The Effect of Hydrogen Content on the Photovoltaic Properties of Amorphous Silicon", J. Electrochem. Soc., vol. 126, pp. 688-691 (1979).

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