Fabricating a narrow width EEPROM with single diffusion electrod

Details Fabricating a narrow width EEPROM with single diffusion electrod Fabricating a narrow width EEPROM with single diffusion electrod

1991-01-28

1992-03-10

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437 49, 437979, 148DIG31, 148DIG111, H01L 21265, H01L 2172

Patent

active

050949683

ABSTRACT:
An EEPROM design featuring narrow linear electrodes including a source, a drain, a thin oxide, channel and floating gate. A pair of linear, opposed field oxide barrier walls form widthwise boundaries of the active structure which can be very closely spaced. The drain electrode, implanted in the substrate, abuts both opposed field oxide lateral walls, but does not extend under either wall. The source, drain and channel are formed in a single implant followed by diffusion after the field oxide barrier walls are formed, but prior to formation of the floating gate. All but opposed field oxide walls in a stripe design. A control gate is disposed over the floating gate. The combination of opposed field oxide barrier walls, a stripe electrode design, and single step implant for electrode formation results in a very compact cell, utilizing a simplified EEPROM process.

REFERENCES:
patent: 4132904 (1979-01-01), Harari
patent: 4203158 (1980-05-01), Frohman-Bentchkowsky
patent: 4375087 (1983-02-01), Wanlass
patent: 4477825 (1984-10-01), Yaron et al.
patent: 4642881 (1987-02-01), Matsukawa et al.
patent: 4727043 (1988-02-01), Matsumoto et al.
patent: 4822750 (1989-04-01), Perlegos et al.
patent: 4851361 (1989-07-01), Schumann et al.
patent: 4945068 (1990-07-01), Sugaya
Harari et al., "A 256-Bit Nonvolatile Static RAM," 1978 IEEE International Solid State Circuits Conference, Digest of Technical Papers, pp. 108-109.

Affiliated with

Also associated with

Rating

Fabricating a narrow width EEPROM with single diffusion electrod does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fabricating a narrow width EEPROM with single diffusion electrod, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabricating a narrow width EEPROM with single diffusion electrod will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2284336