Extrusion enhanced mask for improving process window

Details Extrusion enhanced mask for improving process window Extrusion enhanced mask for improving process window

1999-03-11

2000-09-05

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061140740

ABSTRACT:
A pattern for a mask used in lithographic processing, in accordance with the invention, includes a plurality of elongated structures disposed substantially parallel to each other on a substrate and a plurality of sub-resolution extrusions extending transversely from the elongated structures into spaces between the elongated structures, the plurality of extrusions having a substantially same size in a direction parallel to the elongated structures, the plurality of extrusions being spaced apart periodically in the direction parallel to the elongated structures, the elongated structures and extrusions being formed from an energy absorbent material.

REFERENCES:
patent: 5731109 (1998-03-01), Hwang
patent: 5851701 (1998-12-01), Rolfson

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