Chemistry: electrical current producing apparatus – product – and – Fluid active material or two-fluid electrolyte combination...
Patent
1980-10-27
1982-10-26
LeFevour, Charles F.
Chemistry: electrical current producing apparatus, product, and
Fluid active material or two-fluid electrolyte combination...
429128, 429155, 429196, H01M 436
Patent
active
043562400
ABSTRACT:
An extremely high rate flat cell and a method of fabrication thereof with the cell comprising successive stacked anode and cathode layers within a cell container comprised of two members with co-fitting external flanges. Each cathode layer embodies a metallic extension or tab therefrom for external terminal connection. The extensions of all the cathode layers are substantially symmetrically positioned between said co-fitting external flanges with said flanges and metallic extensions all being simultaneously welded together and electrically interconnected during cell sealing. The anode layers are electrically connected together, preferably by pressure contacting layers to each other adjacent to a metallic terminal member for said anode. Such a cell having a lithium anode, a carbon cathode and a thionyl chloride electrolyte solvent/cathode depolarizer (3" diameter.times.0.90" height) safely provides a short circuit current in excess of 1500 amperes at a voltage above 1 volt and about 14 ampere hours at a constant current of 100 amperes.
REFERENCES:
patent: 3369937 (1968-02-01), Himy
patent: 3393095 (1968-07-01), Philipp
patent: 3761314 (1973-09-01), Cailley
patent: 4169920 (1979-10-01), Epstein
patent: 4284691 (1981-08-01), Goebel et al.
Dey Arabinda N.
Hamilton Noble E.
Cornell Ronald S.
Duracell Inc.
LeFevour Charles F.
Nissenbaum Israel
LandOfFree
Extremely high rate flat cell does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Extremely high rate flat cell, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Extremely high rate flat cell will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-948291