Extreme ultraviolet radiation imaging

Details Extreme ultraviolet radiation imaging Extreme ultraviolet radiation imaging

2005-12-06

2005-12-06

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C359S361000, C359S350000, C356S237200

Reexamination Certificate

active

06972419

ABSTRACT:
An extreme (EUV) lithography system includes optical elements which vary the wavelengths of radiation as a function of the angle of incidence on a mask to maximize the reflected radiation intensity.

REFERENCES:
patent: 2003/0043370 (2003-03-01), Goldberg
patent: 2003/0058529 (2003-03-01), Goldstein
patent: 2003/0067598 (2003-04-01), Tomie
Yulin et al., “Spectral reflectance tuning of EUV mirrors for metrology applications,”Proc. of SPIE, vol. 5037, 2003, pp. 286-293.

Affiliated with

Also associated with

Rating

Extreme ultraviolet radiation imaging does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Extreme ultraviolet radiation imaging, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Extreme ultraviolet radiation imaging will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3508357