Extreme ultraviolet pellicle using a thin film and...

Details Extreme ultraviolet pellicle using a thin film and... Extreme ultraviolet pellicle using a thin film and...

2006-12-26

2006-12-26

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07153615

ABSTRACT:
An extreme ultraviolet (EUV) pellicle including a thin film or membrane and a supportive wire mesh. The pellicle allows EUV radiation to pass through the pellicle to a reticle but prevents particles from passing through the pellicle. A buffer gas supports the film against the wire mesh. The film or membrane may be embedded with support fibers or beams.

REFERENCES:
patent: 6731378 (2004-05-01), Hibbs
patent: 6835508 (2004-12-01), Butschke et al.
patent: 7027226 (2006-04-01), Goldberg et al.
Werner A. Goedel, “From Monolayers of a Tethered Polymer Melt to Freely Suspended Elastic Membranes”, 1998 American Chemical Society, Chapter 2, pp. 10-30.

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