Extreme ultraviolet mask with molybdenum phase shifter

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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Reexamination Certificate

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10750122

ABSTRACT:
The present invention describes a method including: providing a substrate, the substrate including a first region and a second region; forming a multilayer mirror over the substrate; forming a phase-shifter layer over the multilayer mirror; forming a capping layer over the phase-shifter layer; removing the capping layer and the phase-shifter layer in the second region; illuminating the first region and the second region with EUV light; and reflecting the EUV light off the first region and the second region.The present invention also describes a structure including: a substrate, the substrate including a first region and a second region; a multilayer mirror located over the first region and the second region; a phase-shifter layer located over the multilayer mirror in the region; an intensity balancer layer located over the multilayer mirror in the second region; and a capping layer located over the phase-shifter layer in the first region and over the intensity balancer layer in the second region.

REFERENCES:
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patent: 6641959 (2003-11-01), Yan
patent: 6875543 (2005-04-01), Chapman et al.
patent: 2002/0146648 (2002-10-01), Ghandehari et al.
patent: 2003/0027053 (2003-02-01), Yan
patent: 2003/0054260 (2003-03-01), Dao et al.
patent: 2004/0091789 (2004-05-01), Han et al.
patent: 58033253 (1983-02-01), None
patent: 61270761 (1986-12-01), None
patent: PCT/US2004/043651 (2004-12-01), None

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