Extreme ultraviolet light source

Details Extreme ultraviolet light source Extreme ultraviolet light source

2006-06-27

2006-06-27

Wells, Nikita (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S251000, C378S119000, C378S034000, C378S143000

Reexamination Certificate

active

07067832

ABSTRACT:
An extreme ultraviolet light source device which makes it possible to increase a working distance and obtain extreme ultraviolet light with a high output. The extreme ultraviolet light source device generates a plasma by irradiating a target (22) with laser light from a driving laser device (25), and generates extreme ultraviolet (EUV) light with a wavelength of several nanometers to several tens of nanometers. The extreme ultraviolet light source device comprises a target supply device which has a charge applying unit (23) that applies a charge to the target (22), and an acceleration unit (24) which accelerates the charged target (22) using an electromagnetic field. The target supply device supplies the target (22) comprised of a rare gas element such as xenon (Xe) or the like, or a metal such as lithium (Li), tin (Sn), tin oxide (SnO2) or the like, as ionized molecules, atoms or masses comprising a plurality of atoms, or as ionized clusters.

REFERENCES:
patent: 5991360 (1999-11-01), Matsui et al.
patent: 6377651 (2002-04-01), Richardson et al.
patent: 6867843 (2005-03-01), Ogushi et al.
patent: 0858249 (1998-08-01), None
patent: 2000-002800 (2000-01-01), None
patent: 2000-008891 (2002-01-01), None

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