Extreme ultra violet light source device

Details Extreme ultra violet light source device Extreme ultra violet light source device

2007-02-06

2007-02-06

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

Reexamination Certificate

active

11341636

ABSTRACT:
An LPP EUV light source device for forming a uniform droplet target regardless of a frequency of a drive signal applied to a vibrator. The LPP EUV light source device includes: a chamber in which the extreme ultra violet light is generated; an injection nozzle that injects a target material into the chamber; a vibrator that has two terminals and vibrates to provide vibration to the injection nozzle when a drive signal is applied between the two terminals via a cable; a voltage generator that generates the drive signal; a controller that monitors a voltage between the two terminals of the vibrator and feedback controls the voltage generator such that an amplitude of the monitored voltage falls within a predetermined range; and a laser source that generates a laser beam to be irradiated to the target material injected from the injection nozzle.

REFERENCES:
patent: 2006/0192154 (2006-08-01), Algots et al.
patent: 2006/0193997 (2006-08-01), Bykanov
patent: 2004-6365 (2004-01-01), None
patent: 2004-31342 (2004-01-01), None
patent: 2004-111907 (2004-04-01), None
H.M. Hertz et al., entitled “Debris Free Soft X-Ray Generation Using a Liquid Droplet Laser Plasma Target”, SPIE, vol. 2523, pp. 88-93.
U. Schwenn et al., entitled “A Continuous Droplet Source for Plasma Production with Pulse Lasers”, Journal of Physics E: Scientific Instruments, vol. 7, 1974, pp. 715-718.

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