Extreme ultra violet light source device

Details Extreme ultra violet light source device Extreme ultra violet light source device

2007-09-18

2007-09-18

Berman, Jack I. (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S493100, C250S42300F, C378S119000

Reexamination Certificate

active

11214819

ABSTRACT:
An EUV light source device for protecting a collection mirror from debris that is considered harmful to a mirror coating. The EUV light source device includes: a chamber in which extreme ultra violet light is generated; a target injection unit and a target injection nozzle that supply the chamber with a material to become the target; a laser light source that applies a laser beam to the target so as to generate plasma; a collection mirror that collects the extreme ultra violet light emitted from the plasma; an X-ray source that ionizes neutral particles included in particles emitted from the plasma into charged particles; and plural magnets that generate a magnetic field within the chamber so as to trap at least the charged particles ionized by the X-ray source.

REFERENCES:
patent: 4886969 (1989-12-01), Knauer
patent: 7087914 (2006-08-01), Akins et al.
patent: 7164144 (2007-01-01), Partlo et al.
patent: 2552433 (1996-08-01), None
patent: 3433151 (2003-05-01), None

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