Extreme ultra violet light source apparatus

Details Extreme ultra violet light source apparatus Extreme ultra violet light source apparatus

2011-03-29

2011-03-29

Nguyen, Kiet T (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

Reexamination Certificate

active

07915600

ABSTRACT:
An extreme ultra violet light source apparatus has a relatively high output for exposure and suppresses the production of debris as much as possible instead of disposing of debris that has been produced. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply unit for supplying solid tin or lithium as a target to a predetermined position within the chamber; a CO2laser for applying a laser beam based on pulse operation to the target supplied by the target supply unit so as to generate plasma; and a collector mirror having a multilayer film on a reflecting surface thereof, for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.

REFERENCES:
patent: 4704718 (1987-11-01), Suckewer
patent: 6307913 (2001-10-01), Foster et al.
patent: 6977383 (2005-12-01), Rieger et al.
patent: 6987279 (2006-01-01), Hoshino et al.
patent: 7067832 (2006-06-01), Mizoguchi et al.
patent: 7609816 (2009-10-01), Rocca
patent: 2005/0279946 (2005-12-01), Rettig et al.
patent: 02/46839 (2002-06-01), None
patent: 2004/092693 (2004-10-01), None
Takeshi Kobayashi, et al., “Generation and Control of Ablation Plasma 1(Laser)”, Journal of Plasma and Fusion Research, vol. 76, No. 11, Nov. 2000, pp. 1145-1150.
Björn A. Hansson et al., “LLP EUV Source Development for HVM”, SPIE, vol. 6151, No. 61510R, Feb. 2006.

Affiliated with

Also associated with

Rating

Extreme ultra violet light source apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Extreme ultra violet light source apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Extreme ultra violet light source apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2668506