Extreme low resistivity light attenuation anti-reflection...

Details Extreme low resistivity light attenuation anti-reflection... Extreme low resistivity light attenuation anti-reflection...

2007-10-05

2010-02-02

Xu, Ling (Department: 1794)

Coating processes

Applying superposed diverse coating or coating a coated base

Metallic compound-containing coating

C427S125000, C427S126300, C427S162000, C427S165000, C427S404000, C428S216000, C428S336000, C428S472000, C428S432000, C428S702000, C428S622000, C428S623000, C428S632000, C428S642000, C428S650000

Reexamination Certificate

active

07655280

ABSTRACT:
A extreme low resistivity light attenuation anti-reflection coating structure includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of Ti-based oxide coating layers and a plurality of metal coating layers that are alternately stacked with each other. The composed protection coating layer is formed on the coating module.

REFERENCES:
patent: 2002/0086164 (2002-07-01), Anzaki et al.

Affiliated with

Also associated with

Rating

Extreme low resistivity light attenuation anti-reflection... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Extreme low resistivity light attenuation anti-reflection..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Extreme low resistivity light attenuation anti-reflection... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4167354