Optics: measuring and testing – Inspection of flaws or impurities – Having predetermined light transmission regions
Patent
1996-07-10
1997-07-01
Gonzalez, Frank
Optics: measuring and testing
Inspection of flaws or impurities
Having predetermined light transmission regions
25055945, G01N 2189
Patent
active
056443935
ABSTRACT:
In the present invention, an extraneous substance inspection optical system having an extraneous inspection area of a predetermined scanning width in subscanning direction of a matter to be inspected is positioned in such a manner that the extraneous substance inspection area at a moment when the matter to be inspected is started to move in main scanning direction is arranged at a position in the main scanning direction corresponding to a head portion of the matter to be inspected; the matter to be inspected is moved in the main scanning direction to be subjected to a forward scanning for the matter to be inspected to thereby detect possible extraneous substances in the extraneous inspection area; and the matter to be inspected is rotated by 180.degree. after completing the forward scanning, then the matter to be inspected is moved in the direction opposite to the forward scanning to be subjected to a backward scanning, to thereby detect possible extraneous substances in the extraneous substance inspection area.
REFERENCES:
patent: 4659172 (1987-04-01), Cavan
patent: 4794264 (1988-12-01), Quackenbos et al.
patent: 5377002 (1994-12-01), Malin et al.
patent: 5481202 (1996-01-01), Frye, Jr.
Morishige Yoshio
Nakamura Hisato
Watanabe Tetsuya
Gonzalez Frank
Hitachi Electronics Engineering Co. Ltd.
Smith Zandra V.
LandOfFree
Extraneous substance inspection method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Extraneous substance inspection method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Extraneous substance inspection method and apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-601716