Extraneous substance inspection apparatus for patterned wafer

Details Extraneous substance inspection apparatus for patterned wafer Extraneous substance inspection apparatus for patterned wafer

1996-10-24

1998-03-03

Font, Frank G.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356349, 356430, 356335, G01N 2100

Patent

active

057241325

ABSTRACT:
An extraneous substance inspection apparatus includes a level conversion circuit for converting a level of an extraneous substance detection signal obtained from a position in a first chip into one of multi-valued levels. A judging circuit determines the existence or absence of an extraneous substance by comparing a signal indicative of one of the multi-valued levels with another signal indicative of a converted level obtained by converting a detection signal detected at a similar position in another chip adjacent to the first chip.

REFERENCES:
patent: 5343290 (1994-08-01), Batcheldor et al.
patent: 5369495 (1994-11-01), Lagowski

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