Liquid purification or separation – Processes – Ion exchange or selective sorption
Patent
1992-05-22
1994-01-11
Silverman, Stanley
Liquid purification or separation
Processes
Ion exchange or selective sorption
210675, 210676, C02F 142
Patent
active
052778223
ABSTRACT:
A process for the removal of thermally-stable contaminants from stack gas scrubbing amines using a continuous countercurrent ion exchange column. Amines contaminated after use in stack gas scrubbing are fed into the column containing an anion exchanger resin where the contaminants are sorbed on the resin. The amine is washed from the resin with hot water and is removed from the column. The resin is then pulsed to move the resin with the sorbed contaminants into a elution section of the column. The contaminants are removed using an eluant of sodium hydroxide solution, preferably containing chlorine to enhance elution of thiocyanate ion. A water wash removes traces of the hydroxide solution and any reaction products, and then the resin is again pulsed so as to be moved for reuse. The amines are regenerated with only the single type resin (preferably Type I) and with significantly reduced quantity of reagents.
REFERENCES:
patent: 2687999 (1954-08-01), Bott et al.
patent: 2797188 (1957-06-01), Taylor, Jr. et al.
patent: 2815322 (1957-12-01), Higgins
patent: 3549526 (1970-12-01), Brown
patent: 3565798 (1971-02-01), Barnes
patent: 3580842 (1971-05-01), Higgins
patent: 3896214 (1975-07-01), Newman
patent: 4477419 (1984-10-01), Pearce et al.
patent: 4795565 (1989-01-01), Yan
patent: 4970344 (1990-11-01), Keller
Nessler Cynthia L.
Silverman Stanley
Tetra Technologies Inc.
LandOfFree
Extraction of thermally stable contaminants from stack gas scrub does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Extraction of thermally stable contaminants from stack gas scrub, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Extraction of thermally stable contaminants from stack gas scrub will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1628999