Extraction method for automated determination of source/drain re

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364490, 364578, H01L 2182

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active

054615798

ABSTRACT:
A method estimates source resistance for a transistor. A substrate region under a gate for the transistor is modeled as a gate region having a uniform resistivity .rho..sub.g. A source of the transistor is modeled as a source region having a uniform resistivity .rho..sub.s1. The uniform resistivity .rho..sub.g and the uniform resistivity .rho..sub.s1 are used to calculate a first current from the source of the transistor to a drain of the transistor. The source of the transistor is then modeled as a source region having another uniform resistivity .rho..sub.s2. The uniform resistivity .rho..sub.s2, is different in value than uniform resistivity .rho..sub.s1. The uniform resistivity .rho..sub.g and the uniform resistivity .rho..sub.s2 are used to calculate a second current from the source of the transistor to a drain of the transistor. The uniform resistivity .rho..sub.s1, the uniform resistivity .rho..sub.s2, the first current and the second current are used to calculate the source resistance for the transistor.

REFERENCES:
patent: 4868825 (1989-09-01), Koeppe
patent: 4907053 (1990-03-01), Ohmi
patent: 4907180 (1990-03-01), Smith
patent: 4939681 (1990-07-01), Yokomizo et al.
patent: 5021843 (1991-07-01), Ohmi
patent: 5210699 (1993-05-01), Harrington
patent: 5282148 (1994-01-01), Poirot et al.
patent: 5345401 (1994-09-01), Tani
patent: 5349539 (1994-09-01), Moiryasu
patent: 5361043 (1994-11-01), Shimotashiro et al.
"Resistance Extraction in a Hierarchical IC Artwork Verification System", by S. Mori, IEEE, CH2233-5, pp. 196-198.
G. Yokomizo, A. Yajima, Y. Okamura, T. Sato, HICE: Hierarchical Circuit Extraction System for Layout Verification, Proceedings of the IEEE Custom Integrated Circuits Conference, 1987, pp. 133-136.
Y. Okamura, Y. Muraishi, T. Sato, and Y. Ikemoto, LAS: Layout Pattern Analysis System with New Approach, ICCC, 1982, pp. 308-311.

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