Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1989-11-20
1992-02-04
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31511121, 250423R, 20419211, 20419237, 20429802, 20429804, H01J 2510
Patent
active
050862561
ABSTRACT:
An Mev ion implantation apparatus which does not contaminate a sample substrate with heavy metal particles. The apparatus includes an external resonance circuit type RFQ accelerator incluidng undulated quadrupole electrodes and a separate radio frequency resonance circuit for generating a radio frequency high voltage to be supplied to the electrodes. The undulated quadrupole electrodes and at least a part of metallic supports for supporting the electrodes and voltage supplying lines are provided with a surface coating of silicon, silicon doped with an impurity such as boron, phosphorus, or arsenic, or a light element having a mass number of 28 or less, such as carbon.
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Amemiya Kensuke
Sakudo Noriyuki
Seki Takayoshi
Tokiguchi Katsumi
LaRoche Eugene R.
The Agency of Industrial Science and Technology
Yoo Do Hyun
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