Patent
1989-01-25
1991-10-08
Mintel, William
357 68, 357 80, H01L 2348
Patent
active
050559079
ABSTRACT:
A low cost, lightweight, fast, dense and reliable extended integration semiconductor structure is provided by forming a thin film multilayer wiring decal on a support substrate and aligning and attaching one or more integrated chips to the decal. A support ring is attached to the decal surrounding the aligned and attached integrated substrate, and the support substrate is removed. Reach-through vias connect the decal wiring to the chips.
REFERENCES:
patent: 4580156 (1986-04-01), Comizzoli
patent: 4617730 (1986-10-01), Geldermans et al.
patent: 4648179 (1987-03-01), Bhattacharyya et al.
patent: 4681654 (1987-07-01), Clementi et al.
patent: 4695870 (1987-09-01), Patraw
patent: 4698662 (1987-10-01), Young
patent: 4705205 (1987-11-01), Allen et al.
patent: 4714516 (1987-12-01), Eichelberger et al.
patent: 4755866 (1988-07-01), Marshall et al.
patent: 4766670 (1988-08-01), Gazdik et al.
patent: 4783695 (1988-11-01), Eichelberger et al.
patent: 4890157 (1989-12-01), Wilson
patent: 4958222 (1990-09-01), Takakura et al.
Active Silicon Hybrid Wafer-Scale Packaging, Richard C. Jaeger, SRC Technical Report No. T86046.
Mintel William
Mosaic, Inc.
Potter Roy
LandOfFree
Extended integration semiconductor structure with wiring layers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Extended integration semiconductor structure with wiring layers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Extended integration semiconductor structure with wiring layers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-260770