Optical: systems and elements – Diffraction
Patent
1997-03-17
1998-05-05
Dzerzynski, Paul M.
Optical: systems and elements
Diffraction
356 3, 382254, G02B 518
Patent
active
057483710
ABSTRACT:
A system for increasing the depth of field and decreasing the wavelength sensitivity and the effects of misfocus-producing aberrations of the lens of an incoherent optical system incorporates a special purpose optical mask into the incoherent system. The optical mask has been designed to cause the optical transfer function to remain essentially constant within some range from the in-focus position. Signal processing of the resulting intermediate image undoes the optical transfer modifying effects of the mask, resulting in an in-focus image over an increased depth of field. Generally the mask is placed at a principal plane or the image of a principal plane of the optical system. Preferably, the mask modifies only phase and not amplitude of light. The mask may be used to increase the useful range of passive ranging systems.
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Cathey, Jr. Wade Thomas
Dowski, Jr. Edward Raymond
Dzerzynski Paul M.
Hancock E. C.
Jr. John Juba
Sirr F. A.
The Regents of the University of Colorado
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