Exposure tool and method capable of correcting high (N-TH) order

Photocopying – Projection printing and copying cameras – Step and repeat

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356399, 356401, G01B 1126, G03B 2742

Patent

active

06008880&

ABSTRACT:
A light exposure tool of the present invention is so structured as to enable the correction of a linear intrafield error of a shot and of a higher-order intrafield error of the shot depending upon an interfield of a wafer. The light exposure tool comprises a reticle having a written circuit pattern, a reticle stage having the reticle placed on it, a reticle XY stage drive controller, a reticle stage position measuring mechanism, a wafer stage having a semiconductor wafer placed on it, the semiconductor wafer having a plurality of alignment marks formed on it for position identification, a wafer XY stage drive controller, a wafer stage position measuring mechanism, a projection optical mechanism for projecting the circuit pattern of the reticle onto the wafer to create a shot, an alignment mechanism for detecting positions of the alignment marks 9 and setting the reticle and wafer in a desired position, a calculation device, a shot rotation adjusting controller, and an isotropic magnification controller. At a time of light exposures by the projection optical mechanism on the wafer, a per-exposure systematic error of at least one of a rotation error, magnification error and skew error is approximated with an n-th order function Ls (x, y) in an interfield coordinate (x, y) of the wafer to control the alignment mechanism in accordance with the function Ls (x, y) and to correct the per-exposure systematic error depending upon the interfield coordinate of the wafer.

REFERENCES:
patent: 5194893 (1993-03-01), Nishi
patent: 5498501 (1996-03-01), Shimoda et al.
patent: 5563708 (1996-10-01), Nakai
patent: 5734462 (1998-03-01), Sakai
patent: 5805866 (1998-09-01), Magome et al.
patent: 5808910 (1998-09-01), Irie et al.
patent: 5835196 (1998-11-01), Jackson

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure tool and method capable of correcting high (N-TH) order does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure tool and method capable of correcting high (N-TH) order, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure tool and method capable of correcting high (N-TH) order will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2386135

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.