Exposure system with exposure controlling acoustooptic element

Details Exposure system with exposure controlling acoustooptic element Exposure system with exposure controlling acoustooptic element

1988-02-02

1990-08-07

Mottola, Steven

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250205, G01J 132

Patent

active

049470477

ABSTRACT:
An exposure system is disclosed which uses a pulsed laser, such as an excimer, as the light source for exposure. For exposure control, an acoustooptic element is used. More specifically, the acoustooptic element is used to modulate the intensity of a pulsed laser beam emitted from the excimer laser, to thereby allow precise control of the exposure with respect to a wafer having a resist coating.

REFERENCES:
patent: 3778791 (1973-12-01), Lewicki et al.
patent: 4703166 (1987-10-01), Bruning
patent: 4773750 (1988-09-01), Bruning
patent: 4785192 (1988-11-01), Bruning
patent: 4811055 (1989-03-01), Hirose
Roshon, D. D., Jr., "Laser Modulation Control Method", IBM Tech. Dis. Bull., vol. 12, No. 3, Aug. 1969, p. 485.

Affiliated with

Also associated with

Rating

Exposure system with exposure controlling acoustooptic element does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure system with exposure controlling acoustooptic element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure system with exposure controlling acoustooptic element will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-962113