Exposure system for lithography apparatus

Details Exposure system for lithography apparatus Exposure system for lithography apparatus

1996-07-24

1998-10-20

Moses, R. L.

Photocopying

Projection printing and copying cameras

Focus or magnification control

355 53, 355 67, G03B 2752, G03B 2742, G03B 2754

Patent

active

058254684

ABSTRACT:
A substrate is mounted on a stage of an exposure system, and an exposure light is converged on a material formed on the substrate to form a latent image. An auto-focusing light is emitted on the latent image, and the reflected light therefrom is detected. The focusing or defocusing state is judged on the basis of the detected result. When it is judged that the exposure light is defocused on the material formed on the substrate, the drive unit is driven for focus control so as to allow the exposure light to be focused on the material formed on the substrate.

REFERENCES:
patent: 4982226 (1991-01-01), Takahashi
patent: 5270771 (1993-12-01), Sato
patent: 5309197 (1994-05-01), Mori et al.
patent: 5361122 (1994-11-01), Kataoka et al.
patent: 5502311 (1996-03-01), Imai et al.
patent: 5587794 (1996-12-01), Mizutani et al.
patent: 5602399 (1997-02-01), Mizutani
patent: 5684565 (1997-11-01), Oshida et al.

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