Exposure system, device production method, semiconductor...

Details Exposure system, device production method, semiconductor... Exposure system, device production method, semiconductor...

2005-05-03

2005-05-03

Niebling, John F. (Department: 2812)

Electrophotography

Control of electrophotography process

Of plural processes

Reexamination Certificate

active

06889014

ABSTRACT:
An exposure system includes a wafer processing apparatus for performing a preparation-for-exposure process on a wafer before an exposure process is performed, an exposure apparatus for performing the exposure process on the wafer subjected to the preparation-for-exposure process performed by the wafer processing apparatus, wherein the exposure apparatus also performs a calibration process to correct an error caused by a time-varying environmental parameter and/or caused by the exposure apparatus itself, and a host computer connected to the wafer processing apparatus and the exposure apparatus via communication means. Depending on the time needed for the wafer processing apparatus to perform the preparation-for-exposure process, the host computer outputs a calibration execution command for performing the calibration process to the exposure apparatus. Thereby, the total time from the start of processing a lot to the end thereof is minimized and thus, the total throughput is improved.

REFERENCES:
patent: 5424552 (1995-06-01), Tsuji
patent: 5965308 (1999-10-01), Ozawa
patent: 6331885 (2001-12-01), Nishi
patent: 6404911 (2002-06-01), Ishihara
patent: 6418281 (2002-07-01), Ohki
patent: 6459292 (2002-10-01), Oikawa
patent: 6466300 (2002-10-01), Deguchi
patent: 6493065 (2002-12-01), Ina

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