Exposure system and method with group compensation

Details Exposure system and method with group compensation Exposure system and method with group compensation

2006-06-06

2006-06-06

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S030000, C438S014000, C438S401000

Reexamination Certificate

active

07056631

ABSTRACT:
An exposure system with group compensation. The exposure system includes a lot classification database, a compensation unit and a first exposure device. The lot classification database records a group classification of at least one lot wafer. The compensation unit obtains the group classification of the lot wafer from the lot classification database, retrieves a group compensation value according to the group classification, and compensates overlay parameters according to the group compensation value. The first exposure device performs a back-end process including overlay and exposure processes on the lot wafer using the compensated overlay parameters.

REFERENCES:
patent: 6737208 (2004-05-01), Bode et al.
patent: 6815232 (2004-11-01), Jones et al.

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