Exposure system and method of forming fluorescent surface using

Details Exposure system and method of forming fluorescent surface using Exposure system and method of forming fluorescent surface using

1999-12-09

2000-10-31

Adams, Russell

Photocopying

Projection printing and copying cameras

Step and repeat

356 67, G03B 2742, G03B 2754

Patent

active

061410837

ABSTRACT:
A exposure system for use in forming phosphor layers of a plasma display panel, capable of forming the phosphor layers with minimum light exposure, is provided. The exposure system is used in a process of forming the phosphor layers wherein the phosphor layers are formed first by forming photosensitive phosphor layer forming layers at least between barrier ribs facing each other, provided on a work substrate, and by exposing via a photomask, after alignment of the photomask with the work substrate, the photosensitive phosphor layer forming layers, and subsequently, developing, and heat treating same. The exposure system includes an exposure light source disposed such that divergent or diffused rays of light are radiated from above the photomask. With the exposure system, the light rays can reach to the underside of the photomask, preventing the shadow of the photomask from being cast on critical regions with the result that the phosphor layers in a desired shape can be formed with less light exposure than in the case of utilizing collimated rays of light.

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