Exposure system and method

Details Exposure system and method Exposure system and method

2005-03-29

2005-03-29

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

C355S055000

Reexamination Certificate

active

06873399

ABSTRACT:
An exposure system. The exposure system includes a compensation unit and an exposure device. The compensation unit receives at least one adjustment value of a corresponding equipment parameter, and compensates a corresponding overlay parameter according to the adjustment value and an adjustment formula corresponding to the equipment parameter. The exposure device performs overlay and exposure processes on a wafer using the compensated overlay parameter.

REFERENCES:
patent: 5965309 (1999-10-01), Ausschnitt et al.
patent: 6221787 (2001-04-01), Ogata
patent: 6368883 (2002-04-01), Bode et al.
patent: 6700648 (2004-03-01), Jun et al.
patent: 20020111038 (2002-08-01), Matsumoto et al.
patent: 20030059691 (2003-03-01), Morimoto

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