Exposure system and illuminating apparatus used therein and meth

Details Exposure system and illuminating apparatus used therein and meth Exposure system and illuminating apparatus used therein and meth

1995-02-24

1996-09-24

Grimley, Arthur T.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 355 77, G03B 2742, G03B 2772, G03B 2732

Patent

active

055595839

ABSTRACT:
An exposure system includes at least an illuminating system for irradiating a linearly polarized illumination light on a mask with a predetermined pattern and a mounting system on which a wafer is placed, the wafer is provided thereon with a resist film, wherein further provision is made of an element for controlling a polarization direction of the light at a p-polarization direction at least when the light is irradiated on a sloped or vertical portion of the wafer.

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patent: 5329333 (1994-07-01), Noguchi et al.
patent: 5442184 (1995-08-01), Palmer et al.
patent: 5467166 (1995-11-01), Shiraishi
D. Fehrs, "Illuminator Modification of an Optical Aligner", KTI Microelectronics Seminar, Nov. 6-7, 1989, pp. 217-230.
E. Shalom et al., "Sidewall profile control through processing and dye additives", Advances in Resist Technology and Processing VII, 1990, pp. 188-205.
D. Dunn et al., "DUV Photolithography Linewidth Variation From Reflective Substrates", Optical/Laser Microlithography IV, 1991, pp. 8-15.

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