Exposure system and exposure method

Details Exposure system and exposure method Exposure system and exposure method

2006-04-04

2006-04-04

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S063000, C355S071000, C250S492200, C250S548000

Reexamination Certificate

active

07023523

ABSTRACT:
Exposure systems are disclosed having a configuration in which a field stop is positioned in proximity to a reflection-type mask, but that satisfactorily minimize adverse effects on the image-forming performance of the projection-optical system. The systems transfer a mask pattern accurately and with high throughput onto a photosensitive substrate. The system comprises an illumination-optical system (1, 2) that illuminates a reflection-type mask (M) on which is formed a prescribed pattern. A projection-optical system forms an image of the mask pattern on the photosensitive substrate (W). The mask and substrate are moved in a prescribed direction relative to the projection-optical system to project the mask pattern onto and expose the photosensitive substrate. The illumination-optical system has a field stop (19), positioned in proximity to the mask, that defines the illumination area on the mask. The interval between the mask and the field stop satisfies a prescribed conditional relation.

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