Exposure system

Details Exposure system Exposure system

2008-07-01

2008-07-01

Pham, Hai C (Department: 2861)

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Light or beam marking apparatus or processes

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C347S232000

Reexamination Certificate

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10957675

ABSTRACT:
An exposure system is provided with an exposure head formed of a red organic EL element which emits light in a red region and another organic EL element which emits light in a predetermined wavelength range shorter than the red region. The exposure system exposes a color photosensitive body containing therein at least a red silver-salt photosensitive material sensitive to the light in the red region and another silver-salt photosensitive material sensitive to the light in the predetermined wavelength range. An optical filter cuts the wavelength components which are shorter than the predetermined wavelength range and included in a sensitive range of the red silver-salt photosensitive material.

REFERENCES:
patent: 6147697 (2000-11-01), Deguchi et al.
patent: 6624839 (2003-09-01), Gaudiana et al.
patent: 2001/0052926 (2001-12-01), Hori

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