Exposure system

Details Exposure system Exposure system

1991-01-16

1993-07-13

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 43, G03B 2742

Patent

active

052278387

ABSTRACT:
An exposure system includes a pulse light source emitting light in response to a trigger signal and giving a predetermined exposure light quantity by a plurality of times of light emission. A reticle has an alignment mark and a light exposure pattern. A projection lens contractedly projects the pattern of the reticle. A wafer has an alignment mark to be located. The wafer is exposed to a projection of the pattern. A wafer stage is movable and carries the wafer. A laser interferometer measures a position of the wafer stage. An alignment device serves to detect a condition of an alignment of the wafer with respect to the reticle in an exposure position.

REFERENCES:
patent: 3494695 (1970-02-01), Sollima et al.
patent: 4669867 (1987-06-01), Uda et al.
patent: 4699515 (1987-10-01), Tanimoto et al.
patent: 4794426 (1988-12-01), Nishi
patent: 4812880 (1989-03-01), Ogawa et al.
patent: 4843563 (1989-06-01), Takahashi et al.
patent: 4884101 (1989-11-01), Tanimoto
patent: 4958082 (1990-09-01), Makinouchi
"Sensor and Locating Technique in Semiconductor Lithography" by Murakami et al; published in 1989.

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