Exposure process for writing a pattern on an object

Fishing – trapping – and vermin destroying

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437 7, 437924, 437935, 437948, H01L 21268

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active

052388700

ABSTRACT:
A method for exposing a surface of an object to a radiation beam for writing a pattern thereon. The method includes the steps of producing a radiation, shaping the radiation to form a shaped radiation beam such that the shaped radiation beam has an elongated cross section extending in a first direction, directing the shaped radiation beam to a reticle that carries a transparent pattern and an opaque pattern for patterning the shaped radiation beam to form a patterned beam in accordance with the transparent and opaque patterns upon passage through the reticle and for illuminating the surface of the object by the patterned beam, and maintaining a focusing of the patterned beam on the surface of the object by moving said object, wherein the step of directing the patterned beam includes a step for scanning the patterned beam in a second, different direction over a surface of the reticle.

REFERENCES:
patent: 4200395 (1980-04-01), Smith et al.
patent: 4232969 (1980-11-01), Wilczynski
patent: 4377028 (1983-03-01), Imahashi
patent: 4414749 (1983-11-01), Johannsmeier
"The Optical Stepper with a High Numerical Aperture i-line Lens and a Field-by-Field Leveling System", SUWA et al, SPIE vol. 922 Optical/Laser Microlithography (1988), pp. 270-276.

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