Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-01-12
2008-08-05
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07407730
ABSTRACT:
An exposure pattern or mask inspection and manufacture method and an exposure pattern or mask are provided which can perform comparison inspection of the exposure pattern or mask with ease and at a high precision. A mask pattern portion for exposing a predetermined pattern by an exposure beam is inspected by disposing a plurality of dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing at least the portion of the mask pattern portion with the dummy inspection pattern portion or portions.
REFERENCES:
patent: 5831272 (1998-11-01), Utsumi
patent: 6855997 (2005-02-01), Suwa
EPL: Electron-beam Proximity Lithography, “Projection Exposure with Variable Axis Immersion Lenses: A high-Throughput Electron Beam Approach to Suboptical Lithography” H.C. Pfeiffer, Jpn. J. Appl. Phys. vol. 34 (1995) pp. 6658-6662.
LEPL: Low Energy Electron-beam Proximity Projection lithography, Characterization of a Process Devlopment Tool for Ion Projection Lithography, hans Loeschner, et al., J. Vac. Sci. technol. B19, (2001).
Kananen Ronald P.
Rader & Fishman & Grauer, PLLC
Sony Corporation
Young Christopher G.
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