Exposure method utilizing alignment of superimposed layers

Details Exposure method utilizing alignment of superimposed layers Exposure method utilizing alignment of superimposed layers

1996-10-10

1999-01-26

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 30, G03F 900

Patent

active

058636803

ABSTRACT:
Disclosed is an exposure method for exposing an image of a pattern formed on a mask to plural layers superimposed upon a substrate, comprising: the step of storing an alignment error between the plural layers together with at least one of exposure data and alignment data; the step of setting alignment data upon exposing another pattern to the substrate on the basis of at least one of the exposure data and alignment data; and the step of displacing the mask and the substrate relative to each other on the basis of the alignment data set in the previous step. There is further disclosed an exposure apparatus for exposing an image of a pattern formed on a mask to plural layers superimposed upon a substrate, comprising a storage for storing alignment errors between the plural exposure layers together with at least one of exposure data and alignment data; and a control unit connected to the storage for setting alignment data upon exposing another pattern to the substrate on the basis of at least one of the exposure data and alignment data; wherein the control unit controls the mask and the substrate so as to be displaced relative to each other on the basis of the alignment data set.

REFERENCES:
patent: 4833621 (1989-05-01), Umatate
patent: 5451479 (1995-09-01), Ishibashi

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